Precision measuring microscope is developed for semiconductor, wafer manufacturing, electronic information and metallurgical industry. Also it can be used as an advanced metallurgical microscope and to analyze and identify histology of various metals and alloy, therefore it is widely applied for cast quality identification , raw materials examination and metal structure analysis of material after process in factory and laboratory.
Main technical parameters
Item |
Parameter |
Item |
Parameter |
Optical system |
Infinite optical system |
Focusing mechanism |
Motorized |
Viewing head |
Trinocular head (0.3X CCD mount adapter) |
Base |
Marble |
Lens in the tube |
Focal distance f=250 mm |
Display divice |
Zero adjust, direction change, data output, TTL signal |
Polarizing device |
analyzer can rotate 360。. The polarizer and analyzer can be removed out of optical path. |
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Illumination |
Epi-illumination: 12V/50W Halogen lam. Transmitted illumination: 5W LED. |
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Stage |
Cross travel: XY 200mm×200mm. Measuring method: metrology grating. Resolution: 0.001 mm. Moving function: X/Y. |
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Options |
1. 300 mega pixel, 500 mega pixel, 800 mega pixel and 1000 mega pixel CMOS
2. Measuring software
3. Objective: 2X (NA0.055/W.D 34 mm), 100X ( NA0.55/W.D 13 mm)
4. Microscopic spectrometer |